Model reduction by condensed continued-fraction method

T. Nigel Lucas

Research output: Contribution to journalArticle

Abstract

It is shown how the continued-fraction method of Chen and Shieh may be used on part of the transfer function to produce reduced-order models when its normal application is unsatisfactory. In addition, the truncation method is shown to be related to this technique.
Original languageEnglish
Pages (from-to)680-681
Number of pages2
JournalElectronics Letters
Volume21
Issue number16
DOIs
StatePublished - 1 Aug 1985

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Lucas, T. Nigel / Model reduction by condensed continued-fraction method.

In: Electronics Letters, Vol. 21, No. 16, 01.08.1985, p. 680-681.

Research output: Contribution to journalArticle

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abstract = "It is shown how the continued-fraction method of Chen and Shieh may be used on part of the transfer function to produce reduced-order models when its normal application is unsatisfactory. In addition, the truncation method is shown to be related to this technique.",
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year = "1985",
month = "8",
doi = "10.1049/el:19850481",
volume = "21",
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journal = "Electronics Letters",
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Model reduction by condensed continued-fraction method. / Lucas, T. Nigel.

In: Electronics Letters, Vol. 21, No. 16, 01.08.1985, p. 680-681.

Research output: Contribution to journalArticle

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AU - Lucas,T. Nigel

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N2 - It is shown how the continued-fraction method of Chen and Shieh may be used on part of the transfer function to produce reduced-order models when its normal application is unsatisfactory. In addition, the truncation method is shown to be related to this technique.

AB - It is shown how the continued-fraction method of Chen and Shieh may be used on part of the transfer function to produce reduced-order models when its normal application is unsatisfactory. In addition, the truncation method is shown to be related to this technique.

U2 - 10.1049/el:19850481

DO - 10.1049/el:19850481

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Lucas TN. Model reduction by condensed continued-fraction method. Electronics Letters. 1985 Aug 1;21(16):680-681. Available from, DOI: 10.1049/el:19850481